@InProceedings{RamirezRamosCoraTrav:2015:ChPuPE,
author = "Ramirez Ramos, Marco Antonio and Corat, Evaldo Jos{\'e} and
Trava-Airoldi, Vladimir Jesus",
affiliation = "{Instituto Nacional de Pesquisas Espaciais (INPE)} and {Instituto
Nacional de Pesquisas Espaciais (INPE)} and {Instituto Nacional de
Pesquisas Espaciais (INPE)}",
title = "Characterization of a Pulsed-DC PECVD System with Active Screen
for DLC Films Growth",
year = "2015",
organization = "The International Conference on Metallurgical Coatings and Thin
Films, 42. (ICMCTF).",
abstract = "Active Screen technique, as an additional cathode, is an advanced
technology used for metal surface plasma nitrating with apparent
advantages over conventional one. Side effects such as arcing or
other way of plasma instability could be considerably reduced with
the use of the active screen technique and thus dealing to an
improved surface quality. Because of the absence of information
concerning the active screen technique used for DLC growth,
specially on different kinds of steels a new and deeper studies
about the process will be considered.[1] Active screen coupled to
PECVD system allows obtaining DLC films with lower pressure, lower
temperature and low power energy consumption, achieving an
inferior production costs with higher adhesion and better quality
films in terms of hardness, density and finishing [2]. Also, the
homogeneity of the coating in large area is improved [3]. In this
work cylindrical actives screens are home manufactured with the
same diameter and different mesh sizes. The temperature variation
on ss 420 substrate as a function of the time in argon plasma
discharge, gas pressure inside of the chamber and screen mesh
sizes were carefully measured. Keeping constant the bias and gas
flow, a very interesting results show that the temperature rise
faster for higher screen mesh even at very low argon pressure in
the plasma discharge and the threshold mesh size and lower
pressure value was found. Also a strong dependence of the final
temperature with the gas pressure reveal the possibilities of
obtaining a better conditions for DLC growth than in the
conventional PECVD system. In order to show a great performance of
this new system a very good DLC films were obtained with good
mechanical, trybological and chemical properties. References [1]
C.X. Li, J. Georges, X.Y. Li, Surf. Eng. 18 (2002) 453458. [2]
C.X. Li, T. Bell, H. Dong, Surf. Eng. 18 (2002) 174181. [3] S.
Corujeira Gallo, H. Dong, Vacuum 84 (2009) 321325.",
conference-location = "San Diego, California",
conference-year = "20-24 apr.",
language = "en",
urlaccessdate = "28 abr. 2024"
}